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Conference Proceedings

1. Avoidance/reduction of charging effects in case of partially insufficient substrate conductivity when using ESPACER 300Z

Plontke, R. ; Bettin, L. ; Beyer, D. ; Butschke, J. ; Irmscher, M. ; Koepernik, C. ; Leibold, B. ; Vix, A. B. E. ; Voehringer, P.

Pub. info.:	20th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.188-196, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5504

Conference Proceedings

2. Second-level imaging of advanced alternating phase-shift masks using e-beam lithography

Leibold, B. ; Butschke, J. ; Bettin, L. ; Beyer, D. ; Irmscher, M. ; Koepernik, C. ; Plontke, R. ; Vix, A. ; Voehringer, P.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.1034-1044, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

Conference Proceedings

3. Alternating aperture phase shift mask process using e-beam lithography for the second level

Koepernik, C. ; Butschke, J. ; Beyer, D. ; Irmscher, M. ; Leibold, B. ; Rausa, E. ; Plontke, R. ; Plumhoff, J. ; Voehringer, P.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.183-192, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446