Allegret, S. ; Rolland, G. ; Guidotti, E. ; Yamasaki, H. ; Holliger, P. ; Pierre, F. ; Martin, F.
Pub. info.:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.324-330, 2005. Pennington, NJ. Electrochemical Society