1.

Conference Proceedings
Conference Proceedings
1. High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask and device making
Huang,W.-S. ; Kwong,R.W. ; Moreau,W.M. ; Lang,R. ; Robinson,C.F. ; Medeiros,D.R. ; Petrillo,K.E. ; Aviram,A. ; Mahorowala,A.P. ; Angelopoulos,M. ; Magg,C. ; Lawliss,M. ; Faure,T.B.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.268-277,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
2.

Conference Proceedings
Conference Proceedings
2. Tunable antireflective coatings with built-in hard mask properties facilitating thin-resist processing
Mahorowala,A.P. ; Babich,K. ; Petrillo,K.E. ; Simons,J.P. ; Angelopoulos,M. ; Patel,V. ; Grill,A. ; Halle,S. ; Conti,R. ; Wu,C.-H.J. ; Wise,R. ; Chen,L. ; Thomas,A.C. ; Lee,B. ; Mahorowala,A.P.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.306-316,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
3.

Conference Proceedings
Conference Proceedings
3. Extension of 248-nm optical lithography: a thin film imaging approach
Lin,Q. ; Katnani,A.D. ; Brunner,T.A. ; DeWan,C. ; Fairchok,C. ; LaTulipe,D.C.,Jr. ; Simons,J.P. ; Petrillo,K.E. ; Babich,K. ; Seeger,D.E. ; Angelopoulos,M. ; Soonyakumaran,R. ; Wallraff,G.M. ; Hofer,D.C.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.278-288,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
4.

Conference Proceedings
Conference Proceedings
4. Positive bilayer resists for 248-and 193-nm lithography
Sooriyakumaran,R. ; Wallraff,G.M. ; Larson,C.E. ; Fenzel-Alexander,D. ; DiPietro,R.A. ; Opitz,J. ; Hofer,D.C. ; LaTulipe,D.C.,Jr. ; Simons,J.P. ; Petrillo,K.E. ; Babich,K. ; Angelopoulos,M. ; Lin,Q. ; Katnani,A.D.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.219-227,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
5.

Conference Proceedings
Conference Proceedings
5. Effects of underlayer on performance of bilayer resists for 248-nm lithography
Babich,K. ; Callegari,A. ; Petrillo,K.E. ; Simons,J.P. ; LaTulipe,D.C.,Jr. ; Angelopoulos,M. ; Lin,Q.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.726-734,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
6.

Conference Proceedings
Conference Proceedings
6. Use of KRS-XE positive chemically amplified resist for optical mask manufacturing
Ashe,B. ; Deverich,C. ; Rabidoux,P.A. ; Peck,B. ; Petrillo,K.E. ; Angelopoulos,M. ; Huang,W.-S. ; Moreau,W.M. ; Medeiros,D.R.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.664-672,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
7.

Conference Proceedings
Conference Proceedings
7. High-resolution patterning in chemically amplified resists: the effect of film thickness
Medeiros,D.R. ; Moreau,W.M. ; Petrillo,K.E. ; Chauhan,M. ; Huang,W.-S. ; Magg,C. ; Goldfarb,D. ; Angelopoulos,M. ; Nealey,P.F.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.241-250,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
8.

Conference Proceedings
Conference Proceedings
8. 193 lithography and RELACS processing for BEOL lithography
DellaGuardia,R. ; Petrillo,K.E. ; Chen,J. ; Rabidoux,P. ; Dalton,T.J. ; Holmes,S.J. ; Hadel,L.M. ; Malone,K. ; Mahorowala,A.P. ; Greco,S. ; Ferguson,R.A.
Pub. info.: Optical Microlithography XIV.  4346  pp.1029-1040,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
9.

Conference Proceedings
Conference Proceedings
9. When is bilayer thin-film imaging suitable: comparison with single-layer resists
Halle,S. ; Thomas,A.C. ; Armacost,M. ; Dalton,T.J. ; Chen,X.L. ; Bukofsky,S.J. ; Genz,O. ; Lu,Z.G. ; Butt,S.A. ; Chen,Z. ; Ferguson,R.A. ; Coker,E. ; Leidy,R.K. ; Lin,Q. ; Mahorowala,A.P. ; Babich,K. ; Petrillo,K.E. ; Angelopoulos,M. ; Ignatowicz,M. ; Bui,B.
Pub. info.: Optical Microlithography XIV.  4346  pp.970-981,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
10.

Conference Proceedings
Conference Proceedings
10. Extending the performance of KRS-XE for high-throughput electron-beam lithography for advanced mask making
Medeiros,D.R. ; Petrillo,K.E. ; Bucchignano,J. ; Angelopoulos,M. ; Huang,W.-S. ; Li,W. ; Moreau,W.M. ; Lang,R. ; Kwong,R.W. ; Magg,C. ; Ashe,B.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.552-560,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562