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Conference Proceedings

1. Progress toward use of a dense plamsa focus as a light source for production EUV lithography

Partlo,W.N. ; Fomenkov,I.V. ; Ness,R.M. ; Oliver,R.I. ; Melnychuk,S.T. ; Rauch,J.E.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.232-248, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343

Conference Proceedings

2. Production-ready 2-kHz KrF excimer laser for DUV Lithography

Myers,D. ; Watson,T.A. ; Das,P.P. ; Padmabandu,G.G. ; Zambon,P. ; Hofmann,T. ; Partlo,W.N. ; Hysham,C. ; Dunning,R.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part2 pp.1038-1049, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

3. Feasibility studies of operating KrF lasers at ultranarrow spectral bandwidths for 0.18-ｦﾌm line widths

Ershov,A.I. ; Hofmann,T. ; Partlo,W.N. ; Fomenkov,I.V. ; Everage,G. ; Das,P.P. ; Myers,D.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.1021-1030, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

4. ArF lasers for production of semiconductor devices with CD <0.15 ｦﾌm

Duffey,T.P. ; Embree,T.J. ; Ishihara,T. ; Morton,R.G. ; Partlo,W.N. ; Watson,T.A. ; Sandstrom,R.L.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.1014-1020, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

5. EUV(13.5-nm)light generation using a dense plasma focus device

Partlo,W.N. ; Fomenkov,I.V. ; Birx,D.L.

Pub. info.:	Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California. Part2 pp.846-858, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3676

Conference Proceedings

6. Performance of very high repetition rate ArF lasers

Hueber,J.-M. ; Besaucele,H. ; Das,P.P. ; Eis,R. ; Ershov,A.I. ; Fleurov,V.B. ; Gaidarenko,D. ; Hofmann,T. ; Melcher,P.C. ; Partlo,W.N. ; Nikolaus,B.K. ; Smith,S. ; Webb,K.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1418-1423, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

7. Development of an EUV(13.5 nm)light source employing a dense plasma focus in lithium vapor

Partlo,W.N. ; Fomenkov,I.V. ; Oliver,R. ; Birx,D.L.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.136-156, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

8. Feasibility of highly line-narrowed F2 laser for 157-nm microlithography

Ershov,A.I. ; Duffey,T.P. ; Onkels,E. ; Partlo,W.N. ; Sandstrom,R.L.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1529-1536, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

9. Wavelength stabilization in an excimer laser source using piezoelectric active vibration control

Spangler,R.L. ; Jacques,R.N. ; Brown,D. ; Algots,J.M. ; Partlo,W.N.

Pub. info.:	Optical Microlithography XIV. 4346 pp.1190-1201, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

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Conference Proceedings

10. Design considerations and performance of 1-kHz KrF excimer lasers for DUV lithography

Morton,R.G. ; Fomenkov,I.V. ; Partlo,W.N. ; Das,P.P. ; Sandstrom,R.L.

Pub. info.:	Optical Microlithography IX. Part2 pp.900-909, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2726

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