1.

Conference Proceedings
Conference Proceedings
1. Comparison of OPC rules and common process windows for 130-nm features using binary and attenuated phase-shift masks
Reilly,M.T. ; Parker,C. ; Kvam,K. ; Socha,R.J. ; Dusa,M.V.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1209-1222,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Integration of ultrathin resist processes into MPU IC manufacturing flows
Cobb,J.L. ; Conley,W. ; Guenther,T. ; Huang,F. ; Lee,J.J. ; Lii,T. ; Dakshina-Murthy,S. ; Parker,C. ; Usmani,S. ; Wu,W. ; Hector,S.D.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.261-272,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345