1.

Conference Proceedings
Conference Proceedings
1. Novel single-layer chemically amplified resist for 193-nm lithography
Choi,S.-J. ; Kang,Y. ; Jung,D.-W. ; Park,C.-G. ; Moon,J.-T.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.104-112,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
2.

Conference Proceedings
Conference Proceedings
2. Design and properties of new deep-UV positive photoresist
Choi,S.-J. ; Jung,S.-Y. ; Kim,C.-H. ; Park,C.-G. ; Han,W.-S. ; Koh,Y.-B. ; Lee,M.-Y.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.323-331,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
3.

Conference Proceedings
Conference Proceedings
3. Application of alternating phase-shifting masks to 200-nm contact holes
Lim,S.-C. ; Woo,S.-G. ; Park,C.-G. ; Koh,Y.-B.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.243-254,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884