1.

Conference Proceedings
Conference Proceedings
1. Fabrication and Characteristics of High Speed Implant-Confined, Index-Guided, Lateral-current, 850 nm Vertical Cavity Surface Emitting Lasers*
Park, K.-Y. ; Chol, H.-H. ; Kim, H.-K. ; Kim, J.-S. ; Kwon, S.-Y. ; Choi, S.-Y.
Pub. info.: State-of-the-art program on compound semiconductors XXXVI and wide bandgap semiconductors for photonic and electronic devices and sensors II : proceedings of the international symposia.  pp.213-224,  2002.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-3
2.

Conference Proceedings
Conference Proceedings
2. The analysis of the criteria of phase error by evaluating the influence of lens aberration on the lithographic performance
Jeong, C.-Y. ; Ahn, J.-K. ; Park, K.-Y. ; Choi, J. S. ; Lee, J. G.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1681-1692,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
3.

Conference Proceedings
Conference Proceedings
3. WDM-PON: a next-generation access network (Invited Paper) [6353-64]
Lee, C.-H. ; Lee, S.-M. ; Choi, K.-M. ; Moon, J.-H. ; Mun S.-G. ; Park, K.-Y. ; Baik, J.-S. ; Park, J.-H. ; Kim. M.-H. ; Lee, H.-K.
Pub. info.: Optical Transmission, Switching, and Subsystems IV.  pp.63531P-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6353
4.

Conference Proceedings
Conference Proceedings
4. Impact of mask defect in a high MEEF process
Jeong, C.-Y. ; Park, K.-Y. ; Choi, J.S. ; Lee, J.G. ; Lee, D.-H.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1067-1078,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
5.

Conference Proceedings
Conference Proceedings
5. The evaluation of assist feature defect printability for sub-0.13-μm technology
Jeong, C.-Y. ; Kim, Y.K. ; Park, K.-Y. ; Choi, J.S. ; Lee, J.G.
Pub. info.: Optical Microlithography XVII.  pp.1255-1266,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
6.

Conference Proceedings
Conference Proceedings
6. CD-SEM calibration with TEM to reduce CD measurement error
Jeong, C.-Y. ; Lee, J. ; Park, K.-Y. ; Lee, W.G. ; Lee, D.-H.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.747-755,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689