1.

Conference Proceedings
Conference Proceedings
1. Quartz etch challenges for 45 nm phase-shift masks [6283-28]
Anderson, A. S. ; Chandrachood, M. ; Grimbergen, M. ; Leung, B. Y. T. ; Ibrahim, I. ; Panayil, S. ; Kumar, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831X-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
2.

Conference Proceedings
Conference Proceedings
2. Quartz etch solutions for 45-nm phase-shift masks [6349-119]
Chandrachood, M. ; Grimbergen, M. ; Leung, T. Y. B. ; Panayil, S. ; Ibrahim, I. ; Kumar, A.
Pub. info.: Photomask Technology 2006.  pp.634934-634934,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
3.

Conference Proceedings
Conference Proceedings
3. Mask etcher data strategy for 45 nm and beyond [6283-26]
Lewington, R. ; Ibrahim, M. I. ; Panayil, S. ; Kumar, A. ; Yamartino, J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831W-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
4.

Conference Proceedings
Conference Proceedings
4. Chrome etch challenges for 45 nm and beyond [6283-27]
Chandrachood, M. ; Grimbergen, M. ; Ibrahim, M. I. ; Panayil, S. ; Kumar, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831V-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
5.

Conference Proceedings
Conference Proceedings
5. Chrome etch solutions for 45-nm and beyond [6349-118]
Chandrachood, M. ; Grimbergen, M. ; Ibrahim, I. ; Panayil, S. ; Kumar, A.
Pub. info.: Photomask Technology 2006.  pp.634933-634933,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
6.

Conference Proceedings
Conference Proceedings
6. Photomask etch challenges for futute technology nodes [6283-132]
Chandrachood, M. ; Grimbergen, M. ; Leung, B. Y. T. ; Koch, R. Yu. K. ; Chen, J. ; Ibrahim, M. I. ; Panayil, S. ; Kumar, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830C-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283