1.

Conference Proceedings
Conference Proceedings
1. Advanced Metal Gate Electrode Options Compatible with ALD and AVD HfSiO x-Based Gate Dielectrics
Z. Karim ; O. Biossiere ; C. Lohe ; Z. Zhang ; C. Manke ; P. Lehnen ; P. K. Baumann ; J. Dalton ; W. Park ; S. Ramanathan ; J. Lindner ; F. Seidel and
Pub. info.: Physics and technology of high-k gate dielectrics 4.  pp.363-374,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 3(3)
2.

Conference Proceedings
Conference Proceedings
2. Alternative Gate Dielectric Materials
S. Van Elshocht ; A. Hardy ; S. De Gendt ; C. Adelmann ; P. K. Baumann ; D. P. Brunco ; M. R. Caymax ; F. Conard ; P. Delugas ; P. Lehnen ; O. Richard ; E. Rohr ; D. Shamiryan ; A. Vos ; F. Witters ; P. Zimmerman ; M. K. Van Bael ; J. Mullens ; M. M. Meuris ; M. M. Heyns
Pub. info.: Physics and technology of high-k gate dielectrics 4.  pp.479-498,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 3(3)