1.

Conference Proceedings
Conference Proceedings
1. Extending immersion lithography to the 32-nm node
S. Warrick ; W. Conley ; V. Farys ; M. Benndorf ; J. Gemmink ; Y. Trouiller ; J. Belledent ; D. Jovanovic ; P. Gouraud
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. Process control for 45 nm CMOS logic gate patterning
B. Le Gratiet ; P. Gouraud ; E. Aparicio ; L. Babaud ; K. Dabertrand
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  1  pp.69220Z-1-69220Z-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922