1.

Conference Proceedings
Conference Proceedings
1. Effect of nonlinear errors on 300-mm wafer overlay performance
Schmidt,S. ; Charles,A.B. ; Ganz,D. ; Hornig,S.R. ; Hraschan,G. ; Maltabes,J.G. ; Mautz,K.E. ; Metzdorf,T. ; Otto,R. ; Scheurich,J. ; Schedel,T. ; Schuster,R.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.857-865,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Process performance comparisons on 300-mm i-line steppers,DUV stepper,and DUV scanners
Schedel,T. ; Charles,A.B. ; Ganz,D. ; Hornig,S.R. ; Hraschan,G. ; Kostler,W. ; Maltabes,J.G. ; Mautz,K.E. ; Metzdorf,T. ; Otto,R. ; Schmidt,S. ; Schuster,R.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.335-342,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Current state of 300-mm lithography in a pilot line environment
Charles,A.B. ; Maltabes,J.G. ; Hornig,S.R. ; Schedel,T. ; Ganz,D. ; Schmidt,S. ; Grant,L. ; Hraschan,G. ; Mautz,K.E. ; Otto,R.
Pub. info.: Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California.  pp.140-153,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3882