1.

Conference Proceedings
Conference Proceedings
1. Diffusion mechanism of water for immersion lithography [6153-38]
Toriumi, M. ; Matsubara, C. ; Otoguro, A. ; Itani,T.
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.615311-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153
2.

Conference Proceedings
Conference Proceedings
2. Fluoropolymers for 157-nm single-layer resists developed using a new etching rate estimation model (KI-Model)
Kawaguchi, Y. ; Sasaki, T. ; Irisawa, J. ; Yokokoji, O. ; Irie, S. ; Otoguro, A. ; Itani, T. ; Fujii, K.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.525-532,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
3.

Conference Proceedings
Conference Proceedings
3. 157-nm resist assessment by a full-field scanner
Otoguro, A. ; Irie, S. ; Ishimaru, T. ; Suganaga, T. ; Itani, T. ; Fujii, K.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.245-253,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
4.

Conference Proceedings
Conference Proceedings
4. A new monocyclic fluropolymer structure for 157-nm photoresists
Takebe, Y. ; Eda, M. ; Okada, S. ; Yokokoji, O. ; Irie, S. ; Otoguro, A. ; Fujii, K. ; Itani, T.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.151-158,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
5.

Conference Proceedings
Conference Proceedings
5. 157-nm single-layer resist based on novel monocyclic fluorinated polymer
Otoguro, A. ; Irie, S. ; Itani, T. ; Fujii, K. ; Takebe, Y. ; Kawaguchi, Y. ; Yokokoji, O.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.186-195,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
6.

Conference Proceedings
Conference Proceedings
6. New trilayer resist process using a phenol-capped siloxane-based middle-layer for ArF resist process
Otoguro, A. ; Takechi, S. ; Deguchi, T. ; Hanyu, I.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.838-846,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039