1.

Conference Proceedings
Conference Proceedings
1. Mask cleaning strategies: particle elimination with minimal surface damage [5992-117]
Osborne, S. ; Nanningas, M. ; Takahashi, H. ; Woster, E. ; Kanda, C. ; Tibbe, J.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59923G-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
2.

Conference Proceedings
Conference Proceedings
2. Mask cleaning strategies: haze elimination [5992-118]
Osborne, S. ; Nanningas, M. ; Takahashi, H. ; Woster, E.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59923H-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
3.

Conference Proceedings
Conference Proceedings
3. Energy distributions of carriers in quantum dot laser structures
Osborne, S. ; Blood, P. ; Smowton, P.M. ; Lutti, J. ; Xin, Y.C. ; Stintz, A. ; Huffaker, D.L. ; Lester, L.F.
Pub. info.: Physics and Simulation of Optoelectronic Devices XII.  pp.63-68,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5349
4.

Conference Proceedings
Conference Proceedings
4. REAP (raster e-beam advanced process) using 50-kV raster e-beam system for sub-100-nm node mask technology
Baik, K.-H. ; Dean, R.L. ; Mueller, M. ; Lu, M. ; Lem, H.Y. ; Osborne, S. ; Abboud, F.E.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.401-411,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
5.

Conference Proceedings
Conference Proceedings
5. Mask cleaning strategies: a continuous ion removal concept [6283-37]
Osborne, S. ; Takahashi, H. ; Woster, E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.628325-628325,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
6.

Conference Proceedings
Conference Proceedings
6. Comparative study between REAP 200 and FEP171 CAR with 50-kV raster e-beam system for sub-100-nm technology
Baik, K.-H. ; Lem, H.Y. ; Dean, R.L. ; Osborne, S. ; Mueller, M. ; Abboud, F.E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.180-189,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130