1.

Conference Proceedings
Conference Proceedings
1. Thick-film positive DUV photoresist for implant layer application
Mori,M. ; Thackeray,J.W. ; Xu,C.B. ; Orsula,G.W. ; Prettyman,E. ; Bell,R. ; Routh,R.M.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.843-853,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
2.

Conference Proceedings
Conference Proceedings
2. Improved lithographic performance for resists based on polymers having a vinyl ether-maleic anhydride (VEMA) backbone
Tanaka,T. ; Choi,S.-J. ; Jung,D.-W. ; Lee,S. ; Lee,S.-H. ; Kang,Y. ; Woo,S.-G. ; Moon,J.-T. ; Kavanagh,R.J. ; Barclay,G.G. ; Orsula,G.W. ; Mattia,J. ; Caporale,S. ; Adams,T.G. ; Tanaka,T. ; Kang,D.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.119-130,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345