1.

Conference Proceedings
Conference Proceedings
1. Application of PGSD (proximity gap suction development) to 70 nm NAND mask fabrication
Sakurai, H. ; Shibata, T. ; Itoh, M. ; Ooishi, K. ; Funakoshi, H. ; Okamoto, Y. ; Oono, S. ; Kaneda, M. ; Kamei, S. ; Hayashi, N.
Pub. info.: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.29-36,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5835
2.

Conference Proceedings
Conference Proceedings
2. New development method eliminating the loading and microloading effect
Ooishi, K. ; Esaki, Y. ; Sakamoto, K. ; Sakurai, H. ; Itoh, M. ; Nakao, M. ; Nishimura, T. ; Miyashita, H. ; Hayashi, N. ; Tanabe, S. ; Oosaki, Y. ; Sasagawa, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.67-77,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Performance of proximity gap suction development (PGSD)
Sakurai, H. ; Itoh, M. ; Esaki, Y. ; Ooishi, K. ; Sakamoto, K. ; Nakao, M. ; Nishimura, T. ; Miyashita, H. ; Hayashi, N.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.737-745,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
4.

Conference Proceedings
Conference Proceedings
4. Novel resist development system for photomasks
Itoh, M. ; Sakurai, H. ; Esaki, Y. ; Ooishi, K. ; Sakamoto, K.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.746-753,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
5.

Conference Proceedings
Conference Proceedings
5. More evolved PGSD (proximity gap suction developer) for controlling movement of dissolution products [6349-175]
Sakurai, H. ; Oppata, Y. ; Murano, K. ; Sakai, M. ; Itoh, M. ; Watanabe, H. ; Funakoshi, H. ; Ooishi, K. ; Okamoto, Y. ; Kaneda, M. ; Kamei, S. ; Hayashi, N.
Pub. info.: Photomask Technology 2006.  pp.63494J-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349