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12 results

Conference Proceedings

1. State-of-the-art performance of stencil mask for LEEPL

Nohama, S. ; Omori, S. ; Iwase, K. ; Watanabe, Y. ; Amai, K. ; Sasaki, T. ; Moriya, S. ; Kitagawa, T.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.970-978, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

2. On-site use of 1x stencil mask: control over image placement and dimension

Omori, S. ; Iwase, K. ; Watanabe, Y. ; Amai, K. ; Sasaki, T. ; Nohama, S. ; Ashida, I. ; Moriya, S. ; Kitagawa, T.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.958-969, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

3. Complementary splitting with stress emulation for stencil masks

Nakayama, K. ; Inoue, K. ; Ashida, I. ; Omori, S. ; Ohnuma, H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.979-989, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

4. Alignment accuracy of LEEPL: image placement error correction

Nohdo, S. ; Motohashi, T. ; Shimazu, N. ; Nakano, H. ; Omori, S. ; Kitagawa, T. ; Moriya, S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.871-878, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

5. Data processing for LEEPL mask: splitting and placement correction

Ashida, I. ; Omori, S. ; Ohnuma, H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.847-856, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

Conference Proceedings

6. Litho-and-mask concurrent approach to the critical issues for proximity electron lithography

Omori, S. ; Iwase, K. ; Amai, K. ; Watanabe, Y. ; Nohama, S. ; Nohdo, S. ; Moriya, S. ; Kitagawa, T. ; Yotsui, K. ; Suzuki, G. ; Tamura, A.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.132-142, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

Conference Proceedings

7. Lithography of choice for the 45-nm node: new medium, new wavelength, or new beam?

Uesawa, F. ; Katsumata, M. ; Ogawa, K. ; Takeuchi, K. ; Omori, S. ; Yoshizawa, M. ; Kawahira, H.

Pub. info.:	Optical Microlithography XVII. pp.34-45, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

Conference Proceedings

8. First via-hole TEG fabricated by using 90-nm CMOS technology and proximity electron lithography: electric and lithographic results

Kitagawa, T. ; Yoshizawa, M. ; Iwase, K. ; Omori, S. ; Nohama, S. ; Nakano, H. ; Moriya, S. ; Kawahira, H.

Pub. info.:	Emerging Lithographic Technologies VIII. pp.537-545, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5374

Conference Proceedings

9. Feedforward correction of mask image placement for proximity electron lithography

Omori, S. ; Nohdo, S. ; Motohashi, T. ; Kitagawa, T. ; Susa, T. ; Yotsui, K. ; Itoh, K. ; Tamura, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.906-914, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

10.

Conference Proceedings

10. A novel approach to the mask inspection for proximity electron lithography based on electron beam imaging

Iwase, K. ; Omori, S. ; Nohama, S. ; Yotsui, K. ; Suzuki, G. ; Sasaki, Y. ; Itoh, K. ; Tamura, A. ; Maruyama, S. ; Moriya, S. ; Kitagawa, T.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.915-922, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

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Author: Omori, S.