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13 results

Conference Proceedings

1. Vibration-Damping Capacity of Lotus-Type Porous Magnesium at Room Temperature

Xie, Z.K. ; Banno, T. ; Yamada, Y. ; Tane, M. ; Hyun, S.K. ; Okuda, Y. ; Nakajima, H.

Pub. info.:	Eco-materials processing & design VII : proceedings of the Conference of the 7th International Symposium on Eco-materials Processing & Design, January 8-11 2006, Chengdu, China. pp.694-697, 2006. Uetikon-Zuerich. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	510-511

Conference Proceedings

2. Measurement and Analysis of Vibration Damping Capacity of Lotus-Type Porous Magnesium

Xie, Z.K. ; Hyun, S.K. ; Okuda, Y. ; Nakajima, H.

Pub. info.:	Advanced structural and functional materials design : proceedings of the International Symposium on Advanced Structural and Functional Materials Design, Osaka, Japan, November 10th-12th, 2004. pp.325-330, 2006. Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	512

Conference Proceedings

3. Effect of photoacid generators on the formation of residues in an organic BARC process

Shimomura, K. ; Okuda, Y. ; Okazaki, H. ; Kinoshita, Y. ; Pawlowski, G.

Pub. info.:	Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California. pp.380-387, 1999. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3678

Conference Proceedings

4. Through-pitch anf through-focus characterization of AAPSM for ArF immersion lithography [6281-53]

Konishi, T. ; Kojima, Y. ; Okuda, Y. ; Philipsen, V. ; Leunissen, A. H. L. ; Van Look, L.

Pub. info.:	EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany. pp.62810S-, 2006. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6281

Conference Proceedings

5. Processing Morphology of the PVC/MBS Blend

目次はDivisionごとに分けて掲載されている。論文の順番はDivisionにかかわらず，Session順の通しページになっている。

Pub. info.:	Back to the future : conference proceedings : ANTEC 1992, Detroit, May 3-7. pp.1058-1062, 1992. Brookfield Center, CT. Society of Plastics Engineers, Inc. (SPE)
Title of ser.:	Annual Technical Conference - ANTEC : Society of Plastics Engineers Annual Technical Papers
Ser. no.:	38

Conference Proceedings

6. Measurement and Analysis of Sound Absorption of Porous Magnesium

Xie, Z.K. ; Ikeda, T. ; Okuda, Y. ; Nakajima, H.

Pub. info.:	Designing, processing and properties of advanced engineering materials : proceedings of the 3rd International Symposium on Designing, Processing and Properties of Advanced Engineering Materials, held in Jeju, Korea, November 5-8, 2003. pp.661-664, 2004. Zuerich. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	449-452

Conference Proceedings

7. Study of alternating phase shift mask structures for ArF lithography

Kojima, Y. ; Konishi, T. ; Sasaki, J. ; Tanaka, K. ; Komizo, T. ; Morita, M. ; Shirasaki, M. ; Ohshima, T. ; Takahashi, H. ; Chiba, K. ; Otaki, M. ; Okuda, Y.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.570-577, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

Conference Proceedings

8. Study of mask induced polarization effects on att. PSM in immersion lithography [6283-121]

Mizoguchi, T. ; Kojima, Y. ; Takagi, M. ; Saga, T. ; Haraguchi, T. ; Konishi, T. ; Fukushima, Y. ; Tanaka, T. ; Okuda, Y.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.62831E-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

Conference Proceedings

9. Chemical characteristics of negative-tone chemically amplified resist for advanced mask making: II

Takeshi, K. ; Tanabe, M. ; Inokuchi, D. ; Fukushima, Y. ; Okumoto, Y. ; Okuda, Y.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.1248-1255, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

10.

Conference Proceedings

10. Study of alternating phase-shift mask structure for 65-nm node devices

Konishi, T. ; Komizo, T. ; Takahashi, H. ; Morita, M. ; Ohshima, T. ; Chiba, K. ; Kojima, Y. ; Sasaki, J. ; Tanaka, K. ; Otaki, M. ; Okuda, Y.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.880-888, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

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Author: Okuda, Y.