Search records | 東京工業大学附属図書館文献データベース

You can search for articles included in proceedings of international conferences and technical papers which Tokyo Tech Library holds.
Tokyo Tech members can obtain tables of contents of 17,000 foreign journals by SwetScan. Tokyo Tech Library does not cover all of them.
List of Searchable Databases

Clear Form

Search for other sites by same keyword(s).

CiNii Books

NDL Search

WebcatPlus

amazon

カーリル

WorldCat

Filter

Title:

Author:

ISBN / ISSN / Paper No:

Source Title:

Publisher:

Publication Year:

～

Clear Form

Type:

Conference Proceedings

Technical Paper

Academic Journal

Select: Check all | Remove all

Sort order

10 results

Conference Proceedings

1. Nikon EB Stepper: the latest development status

Suzuki,K. ; Fujiwara,T. ; Hada,K. ; Hirayanagi,N. ; Kawata,S. ; Morita,K. ; Okamoto,K. ; Okino,T. ; Shimizu,S. ; Yahiro,T. ; Yamamoto,H.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.80-87, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343

Conference Proceedings

2. New data postprocessing for e-beam projection lithography

Okamoto,K. ; Kamijo,K. ; Kojima,S. ; Minami,H. ; Okino,T.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.88-94, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343

Conference Proceedings

3. New television with 2D/3D image conversion technologies

Okino,T. ; Murata,H. ; Taima,K. ; Iinuma,T. ; Oketani,K.

Pub. info.:	Stereoscopic displays and virtual reality systems III : 30 January-2 February 1996, San Jose, California. pp.96-103, 1996. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2653

Conference Proceedings

4. Data of scattered electron characteristics in 1OO-kV EB stepper

Morita,K. ; Yahiro,T. ; Shimizu,S. ; Yamamoto,H. ; Hirayanagi,N. ; Fujiwara,T. ; Suzuki,S. ; Shimizu,H. ; Kawata,S. ; Okino,T. ; Suzuki,K.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.703-712, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

5. Chemically amplified ArF resists based on cleavable alicyclic group and the absorption band shift method

Shida,N. ; Okino,T. ; Asakawa,K. ; Ushirogouchi,T. ; Nakase,M.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.102-110, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

6. Investigation of proximity effect correction in electron projection lithography(EPI)

Okino,T. ; Suzuki,K. ; Okamoto,K. ; Kawata,S. ; Uchikawa,K. ; Suzuki,S. ; Shimizu,S. ; Fujiwara,T. ; Yamada,A. ; Kamijo,K.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.235-244, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

7. Nikon EB stepper:its system concept and countermeasures for critical issues

Suzuki,K. ; Fujiwara,T. ; Hada,K. ; Hirayanagi,N. ; Kawata,S. ; Morita,K. ; Okamoto,K. ; Okino,T. ; Shimizu,S. ; Yahiro,T.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.214-224, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

8. Advanced materials for 193-nm resists

Ushirogouchi,T. ; Asakawa,K. ; Shida,N. ; Okino,T. ; Saito,S. ; Funaki,Y. ; Takaragi,A. ; Tsutsumi,K. ; Nakano,T.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part2 pp.1147-1156, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

9. High-accuracy aerial image measurement for electron-beam projection lithography

Yahiro,T. ; Hirayanagi,N. ; Morita,K. ; Irita,T. ; Yamamoto,H. ; Suzuki,S. ; Shimizu,H. ; Kawata,S. ; Okino,T. ; Suzuki,K.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.483-490, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343

10.

Conference Proceedings

10. Dopant Diffusion and Stacking Fault in Silicon during Thermal Oxidation

Okino,T. ; Takaue,R. ; Onishi,M.

Pub. info.:	Proceedings of the 18th International Conference on Defects in Semiconductors : ICDS-18, Sendai, Japan, July 23-28, 1995. pp.1631-1636, 1995. Zurich, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	196-201

Select: Check all | Remove all

Sort order

10 results

Filtering by:

Author: Okino,T.