1.

Conference Proceedings
Conference Proceedings
1. ROOM TEMPERATURE PHOTORESIST REMOVAL PROCESS BY USING KF/H2O2/H2O
Omae, S. ; Jizaimaru, T. ; Ojima, S. ; Ohmi, T.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.488-495,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
2.

Conference Proceedings
Conference Proceedings
2. DETERMINATION OF THE H-PASSIVATION BUILD-UP TIME IN DHF-TREATMEN
Meuris, M. ; Izumi, H. ; Kubo, K. ; Ojima, S. ; Ohmi, T. ; Heyns, M.M.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.444-448,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20
3.

Conference Proceedings
Conference Proceedings
3. STUDY ON MEGASONIC IN ADVANCED WET CLEANING PROCESS
Kubo, K. ; Ojima, S. ; Toda, M. ; Ohmi, T.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.107-114,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20