1.

Conference Proceedings
Conference Proceedings
1. Reversible Martensite Transformation and Shape Memory Effect in Fe-Ni-Co-Al-C Alloys
Ohtsuka,H. ; Kajiwara,S.
Pub. info.: Martensitic transformations : proceedings of the 6th International Conference on Martensitic Transformations, held in Sydney, Australia, 3-7 July, 1989.  Pt.2  pp.661-666,  1990.  Aedermannnsdorf, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 56-58
2.

Conference Proceedings
Conference Proceedings
2. Acid amplification of chemically amplified resists for 193-nm lithography
Ohfuji,T. ; Takahashi,M. ; Kuhara,K. ; Ogawa,T. ; Ohtsuka,H. ; Sasago,M. ; Ichimura,K.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.76-82,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
3.

Conference Proceedings
Conference Proceedings
3. Development of embedded attenuated phase-shifting mask(EAPSM)blanks for ArF lithography
Mitsui,H. ; Nozawa,O. ; Ohtsuka,H. ; Takeuchi,M. ; Kobayashi,H. ; Ushida,M.
Pub. info.: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany.  pp.108-113,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3996
4.

Conference Proceedings
Conference Proceedings
4. In Situ Observation of the Interface Movement in Reverse Martensitic Transformation in Fe-Ni-C Alloys
Kajiwara,S. ; Ohtsuka,H.
Pub. info.: Martensitic transformations : proceedings of the 6th International Conference on Martensitic Transformations, held in Sydney, Australia, 3-7 July, 1989.  Pt.2  pp.673-678,  1990.  Aedermannnsdorf, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 56-58
5.

Conference Proceedings
Conference Proceedings
5. ArF excimer laser lithography with bottom antireflective coating
Kishimura,S. ; Takahashi,M. ; Nakazawa,K. ; Ohfuji,T. ; Sasago,M. ; Uematsu,M. ; Ogawa,T. ; Ohtsuka,H.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.310-321,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
6.

Conference Proceedings
Conference Proceedings
6. Present status of ArF lithography development and mask technology (Invited Paper)
Morimoto,H. ; Ohtsuka,H.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.338-340,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412
7.

Conference Proceedings
Conference Proceedings
7. Development of MoSi-based halftone phase-shift blank and mask fabrication for ArF lithography (Photomask Japan 2000 Best Presentation Award)
Suda,H. ; Mitsui,H. ; Nozawa,O. ; Ohtsuka,H. ; Takeuchi,M. ; Nishida,N. ; Ohkubo,Y. ; Ushida,M.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.58-72,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
8.

Conference Proceedings
Conference Proceedings
8. Development of halftone phase-shift blank and mask fabrication for ArF lithography
Suda,H. ; Mitsui,N. ; Nozawa,O. ; Ohtsuka,H. ; Takeuchi,M. ; Nishida,N. ; Ohkubo,Y. ; Ushida,M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.671-681,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066