1.

Conference Proceedings
Conference Proceedings
1. Method of expanding process window for the double exposure technique with alt-PSMs
Kikuchi,K. ; Ohnuma,H. ; Kawahira,H.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.121-131,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. New mask data processing system for ULSI fabrication
Takenouchi,R. ; Ohnuma,H. ; Ashida,I. ; Nozawa,S.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.178-187,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
3.

Conference Proceedings
Conference Proceedings
3. Fast chip-level OPC system on mask database
Ohnuma,H. ; Tsudaka,K. ; Kawahira,H.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.145-153,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
4.

Conference Proceedings
Conference Proceedings
4. Fast EB-PEC system for 0.25-ｦﾌm device reticle fabrication using a variable shaped beam machine
Tomita,M. ; Ohnuma,H. ; Koyama,M. ; Kawahira,H.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.546-557,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621
5.

Conference Proceedings
Conference Proceedings
5. Automatic alternative phase-shift mask CAD layout tool for gate shrinkage of ebedded DRAM in logic below 0.18 ｦﾌm
Ohnuma,H. ; Kawahira,H.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.206-213,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412
6.

Conference Proceedings
Conference Proceedings
6. New optimization method of exposure with alternative phase-shifting masks
Kikuchi,K. ; Ohnuma,H. ; Kawahira,H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.41-51,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
7.

Conference Proceedings
Conference Proceedings
7. New method for reducing across chip poly-CD variation with statistical OPC/gauge capability analysis
Ohnuma,H. ; Kikuchi,K. ; Kawahira,H.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.362-367,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
8.

Conference Proceedings
Conference Proceedings
8. Quantitative evaluation of focused ion-beam repair for quartz bump defect of alternating phase-shift masks
Kakuta,D. ; Kagami,I. ; Komizo,T. ; Ohnuma,H.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.753-761,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562