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Conference Proceedings

1. Effect of surfactant-added developer on development of the chemically amplified photoresist

Kawada,S. ; Tamai,Y. ; Omae,S. ; Ohmi,T.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part2 pp.717-725, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

2. High-performance metal-gate SOI CMOS fabricated by ultraclean low-temperature process technologies

Ushiki,T. ; Hirano,Y. ; Shimada,H. ; Ohmi,T.

Pub. info.:	Microelectronic Device and Multilevel Interconnection Technology II. pp.28-38, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2875

Conference Proceedings

3. Influence of carbon contamination on ultrathin gate oxide reliability

Iwamoto,T. ; Miyake,T. ; Ohmi,T.

Pub. info.:	Microelectronic Device and Multilevel Interconnection Technology II. pp.207-215, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2875

Conference Proceedings

4. Future manufacturing technology in the year 2000

Ohmi,T.

Pub. info.:	Microelectronic Device and Multilevel Interconnection Technology. pp.16-22, 1995. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2636