Shoki, T. ; Hosoya, M. ; Kinoshita, T. ; Kobayashi, H. ; Usui, Y. ; Ohkubo, R. ; Ishibashi, S. ; Nagarekawa, O.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology IX. pp.857-864, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering