1.

Conference Proceedings
Conference Proceedings
1. Waveguide interleaving filters (Invited Paper)
Chiba, T. ; Arai, H. ; Nounen, H. ; Ohira, K.
Pub. info.: Active and passive optical components for WDM communications III : 8-11 September, 2003, Orlando, Florida, USA.  pp.532-538,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5246
2.

Conference Proceedings
Conference Proceedings
2. Microstructures and Mechanical Properties in Ni3Si-Ni3Ti-Ni3Nb-Based Multi-Intermetallic Alloys
Takasugi, T. ; Ohira, K. ; Kaneno, Y.
Pub. info.: Integrative and interdisciplinary aspects of intermetallics : symposium held November 29-December 1, 2004, Boston, Massachusetts, U.S.A..  pp.291-296,  2005.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 842
3.

Conference Proceedings
Conference Proceedings
3. GalnAsP/InP quantum-wire lasers and distributed reflector lasers with wirelike active regions by lithography and regrowth (Invited Paper)
Arai, S. ; Yagi, H. ; Ohira, K. ; Maruyama, T. ; Tamura, S.
Pub. info.: Novel In-Plane Semiconductor Lasers IV.  pp.303-317,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5738
4.

Conference Proceedings
Conference Proceedings
4. Optical mask inspection strategy for 65-nm node and beyond
Chung, D.-H.P. ; Ohira, K. ; Yoshioka, N. ; Matsumura, K. ; Tojo, T. ; Otaki, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.320-329,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
5.

Conference Proceedings
Conference Proceedings
5. DUV inspection capability for 90-nm node mask in ArF lithography
Ohira, K. ; Kim, B.G. ; Tanaka, K. ; Yoshioka, N. ; Tateno, M. ; Takayama, N. ; Murakami, S. ; Hatta, K. ; Akima, S. ; Matsuo, F. ; Otaki, M.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.1181-1190,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
6.

Conference Proceedings
Conference Proceedings
6. Photomask quality assessment solution for 90-nm technology node
Ohira, K. ; Chung, D.H.P. ; Nobuyuki, Y. ; Tateno, M. ; Matsumura, K. ; Chen, J.-H. ; Luk-Pat, G.T. ; Fukui, N. ; Tanaka, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.364-374,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
7.

Conference Proceedings
Conference Proceedings
7. Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond (Invited Paper) [6283-130]
Kikuiri, N. ; Murakami, S. ; Tsuchiya, H. ; Tateno, M. ; Takahara, K. ; Imai, S. ; Hirano, R. ; Isomura, I. ; Tsuji, Y. ; Tamura, Y. ; Matsumura, K. ; Usuda, K. ; Otaki, M. ; Suga, O. ; Ohira, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830Y-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
8.

Conference Proceedings
Conference Proceedings
8. Performance of novel 198.5-nm wavelength mask inspection system for 65-nm node and beyond optical lithography era
Chung, D. -H. ; Ohira, K. ; Yoshioka, N. ; Matsumura, K. ; Tojo, T. ; Otaki, M.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.993-1004,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
9.

Conference Proceedings
Conference Proceedings
9. Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance
Tojo, T. ; Hirano, R. ; Tsuchiya, H. ; Oaki, J. ; Nishizaka, T. ; Sanada, Y. ; Matsuki, K. ; Isomura, I. ; Ogawa, R. ; Kobayashi, N. ; Nakashima, K. ; Sugihara, S. ; Inoue, H. ; Imai, S. ; Suzuki, H. ; Sekine, A. ; Taya, M. ; Miwa, A. ; Yoshioka, N. ; Ohira, K. ; Chung, D. -H. ; Otaki, M.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1011-1023,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567