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19 results

Conference Proceedings

1. Effect of the dissolution contrast on the process margin in 193-nm lithography

Takahashi,M. ; Kishimura,S. ; Naito,T. ; Ohfuji,T. ; Sasago,M.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.195-204, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

2. Recent advantages of bilevel resists based on silsesquioxane for ArF lithography

Morisawa,T. ; Matsuzawa,N.N. ; Mori,S. ; Kaimoto,Y. ; Endo,M. ; Ohfuji,T. ; Kuhara,K. ; Sasago,M.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.484-492, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

3. Resist cluster formation model and development simulation

Kamon,K. ; Nakazawa,K. ; Yamaguchi,A. ; Matsuzawa,N.N. ; Ohfuji,T. ; Sasago,M. ; Kanzaki,K. ; Tagawa,S.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.472-483, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

4. Negative-type chemically amplified resists for ArF excimer laser lithography

Naito,T. ; Takahashi,M. ; Ohfuji,T. ; Sasago,M.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.503-511, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

5. Theoretical calculations of silylation reaction of photoresists

Matsuzawa,N.N. ; Mori,S. ; Morisawa,T. ; Kaimoto,Y. ; Endo,M. ; Ohfuji,T. ; Kuhara,K. ; Sasago,M.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.493-502, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

6. ArF excimer-laser exposure durability of chromium-fluoride-attenuated phase-shift masks

Seki,Y. ; Ushioda,J. ; Saito,T. ; Maeda,K. ; Nakano,K. ; Iwasa,S. ; Ohfuji,T. ; Tanabe,H.

Pub. info.:	Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.286-293, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3096

Conference Proceedings

7. Acid amplification of chemically amplified resists for 193-nm lithography

Ohfuji,T. ; Takahashi,M. ; Kuhara,K. ; Ogawa,T. ; Ohtsuka,H. ; Sasago,M. ; Ichimura,K.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.76-82, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

8. Time-dependent simulation of acid and product distributions in chemically amplified resist

Kamon,K. ; Nakazawa,K. ; Yamaguchi,A. ; Matsuzawa,N. ; Ohfuji,T. ; Tagawa,S.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.180-188, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

9. High-sensitivity silylation process for 193-nm lithography

Mori,S. ; Kuhara,K. ; Ohfuji,T. ; Sasago,M.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.146-153, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

10.

Conference Proceedings

10. Negative-tone TSI process for 193-nm lithography

Kuhara,K. ; Mori,S. ; Kaimoto,Y. ; Morisawa,T. ; Ohfuji,T. ; Sasago,M.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.188-194, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

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Author: Ohfuji,T.