1.

Conference Proceedings
Conference Proceedings
1. Synthesis of fluorinated materials for 193-nm immersion lithography and 157-nm lithography
Lee, C. H. ; Han, S. ; Park, K. S. ; Kang, H. Y. ; Oh, H. W. ; Lee, J. E. ; Kim, K. M. ; Kim, Y. H. ; Kim, T. S. ; Oh, H.-K.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.564-571,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Conference Proceedings
Conference Proceedings
2. ArF photoresist parameter optimization for mask error enhancement factor reduction [5853-60]
Lee, C. H. ; Han, S. ; Park, K. S. ; Yoon, S. ; Kang, H. Y. ; Oh, H. W. ; Lee, J. E. ; Kim, Y. H. ; Kim, T. S. ; Oh, H.-K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.749-756,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853