1.

Conference Proceedings
Conference Proceedings
1. DETECTION OF THIN INTERFACIAL LAYERS BY PICOSECOND ULTRASONICS
Tas, G. ; Stoner, R.J. ; Maris, H.J. ; Rubloff, G.W. ; Oehrlein, G.S. ; Halbout, J.M.
Pub. info.: Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A..  pp.231-236,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 259
2.

Conference Proceedings
Conference Proceedings
2. OPTICALLY DETECTED MAGNETIC RESONANCE OF A HYDROGEN-RELATED COMPLEX DEFECT IN SILICON
Chen, W.M. ; Awadelkarim, O.O. ; Monemar, B. ; Lindstrom, J.L. ; Oehrlein, G.S.
Pub. info.: Impurities, defects, and diffusion in semiconductors : bulk and layered structures : symposium held November 27-December 1, 1989, Boston, Massachusetts, U.S.A..  pp.377-382,  1990.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 163
3.

Conference Proceedings
Conference Proceedings
3. ANISOTROPIC DRY ETCHING OF SiO2 ON Si ITS IMPACT ON SURFACE AND NEAR-SURFACE PROPERTIES OF THE SUBSTRATE
Oehrlein, G.S. ; Coyle, G.J. ; Tsang, J.C. ; Tromp, R.M. ; Clabes, J.G. ; Lee, Y.H.
Pub. info.: Plasma processing : symposium held April 15-18, 1986, Palo Alto, California, U.S.A..  pp.367-380,  1986.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 68
4.

Conference Proceedings
Conference Proceedings
4. ON THE QUESTION OF OXYGEN DIFFUSION DURING OXYGEN RELATED THERMAL DONOR FORMATION IN SILICON
Oehrlein, G.S. ; Tan, T.Y. ; Kleinhenz, R.L. ; Lindstrom, J.L.
Pub. info.: Materials issues in silicon integrated circuit processing : symposium held April 15-18, 1986, Palo Alto, California, U.S.A..  pp.65-68,  1986.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 71
5.

Conference Proceedings
Conference Proceedings
5. Oxide Etching in Inductively Coupled Fluorocarbon Plasmas
Schaepkens, M. ; Oehrlein, G.S.
Pub. info.: Plasma processing XIII : proceedings of the international symposium.  pp.289-315,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-6