1.

Conference Proceedings
Conference Proceedings
1. The study to enhance the mask global CD uniformity by removing local CD variation
Y. Choi ; M. Kim ; O. Han
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
2.

Conference Proceedings
Conference Proceedings
2. The optimization of CD uniformity and measurement on mask and wafer
Y. Choi ; M. Kim ; O. Han
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
3.

Conference Proceedings
Conference Proceedings
3. Evaluation of litho printability of DRAM contact hole patterns with various programmed defects
K. Seo ; S. Lee ; H. Kim ; D. Hwang ; S. Kim ; G. Jeong ; O. Han ; C. Chen ; D. Yee ; E. Kim ; K. Park ; N. Kim ; S. Choi ; D. Kim ; S. Lohokare
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
4.

Conference Proceedings
Conference Proceedings
4. Preliminary verifiability of the aerial image measurement tool over photolithography process
H. Lee ; G. Jeong ; S. Kim ; O. Han
Pub. info.: Photomask technology 2007.  2  pp.67303A-1-67303A-10,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
5.

Conference Proceedings
Conference Proceedings
5. Self-aligned resist patterning with 172nm and 193nm backside flood exposure on attenuated phase shift masks
J. Chun ; T. Ha ; H. Jung ; S. Jo ; O. Han
Pub. info.: Photomask technology 2007.  3  pp.673044-1-673044-8,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
6.

Conference Proceedings
Conference Proceedings
6. Design for CD correction strategy using a resist shrink method via UV irradiation for defect-free photomask
J. H. Ryu ; D. W. Lee ; H. Y. Jung ; S. P. Kim ; O. Han
Pub. info.: Photomask technology 2007.  1  pp.67300K-1-67300K-10,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
7.

Conference Proceedings
Conference Proceedings
7. The cleaning effects of mask aerial image after FIB repair in sub-80nm node
H. Lee ; G. Jeong ; S. Jeong ; S. Kim ; O. Han
Pub. info.: Photomask technology 2007.  2  pp.673022-1-673022-9,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
8.

Conference Proceedings
Conference Proceedings
8. Mask inspection method for 45nm node device
S. Oh ; Y. Choi ; D. Hwang ; G. Jeong ; O. Han
Pub. info.: Photomask technology 2007.  2  pp.673029-1-673029-9,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730