1.

Conference Proceedings
Conference Proceedings
1. Optical lithography with 157-nm technology
Modderman, T.M. ; Jasper, H. ; Boom, H. ; Uitterdijk, T. ; Dana, S. ; Sewell, H. ; O'Neil, T.K. ; Mulkens, J. ; Brunotte, M. ; Mecking, B. ; Gruner, T.
Pub. info.: Optical Microlithography XVII.  pp.816-826,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
2.

Conference Proceedings
Conference Proceedings
2. Full-field imaging with a 157-nm scanner
Robinson, C. ; Seong, N. ; Kimmel, K. ; Brunner, T.A. ; Hibbs, M. ; Lercel, M.J. ; McCafferty, D. ; Sewell, H. ; O'Neil, T.K. ; Ivaldi, J. ; Andresen, K.
Pub. info.: Optical Microlithography XVII.  pp.1669-1678,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377