1.

Conference Proceedings
Conference Proceedings
1. 0.15-ｦﾌm pattern formation using cell projection electron-beam direct writing with variable shot size
Tamura,T. ; Yamashita,H. ; Nakajima,K. ; Nozue,H.
Pub. info.: Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California.  pp.54-62,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3048
2.

Conference Proceedings
Conference Proceedings
2. One-dimensional calculation method for proximity effect correction in cell projection electron-beam direct writing
Yamada,Y. ; Tamura,T. ; Nakajima,K. ; Nozue,H.
Pub. info.: Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California.  pp.63-68,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3048
3.

Conference Proceedings
Conference Proceedings
3. Highly accurate stitching method between cell projection and variably shaped e-beam shots
Kojima,Y. ; Onoda,N. ; Tokunaga,K. ; Nakajima,K. ; Nozue,H.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.471-477,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
4.

Conference Proceedings
Conference Proceedings
4. Optimization of pattern shape in electron-beam cell projection lithography
Ema,T. ; Yamashita,H. ; Nakajima,K. ; Kobinata,H. ; Nozue,H.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.464-470,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
5.

Conference Proceedings
Conference Proceedings
5. Optimization of PHS-based chemically amplified negative resist for 100-kV electron-beam projection lithography(EPL)
Miyasaka,M. ; Tokunaga,K. ; Koba,F. ; Yamashita,H. ; Nakajima,K. ; Nozue,H.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.344-351,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
6.

Conference Proceedings
Conference Proceedings
6. Development of data conversion system for electron-beam projection lithography (EPL) mask
Yamada,Y. ; Kobinata,H. ; Tamura,T. ; Miyasaka,M. ; Sakamoto,T. ; Ogawa,Y. ; Takada,K. ; Yamashita,H. ; Nozue,H.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.473-482,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
7.

Conference Proceedings
Conference Proceedings
7. Stitching accuracy measurement system for EB direct writing and electron-beam projction lithography (EPL)
Tamura,T. ; Ema,T. ; Nozue,H. ; Sugahara,T. ; Sugano,A. ; Nitta,J.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.704-714,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
8.

Conference Proceedings
Conference Proceedings
8. Defect printability analysis in electron-beam cell projection lithography
Itoh,K. ; Yamashita,H. ; Ema,T. ; Nozue,H.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.230-240,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793
9.

Conference Proceedings
Conference Proceedings
9. Fabricating 100-nm line patterns with high-transmittance ArF attenuated phase-shift masks
Iwasaki,H. ; Ishida,S. ; Tonai,K. ; Nozue,H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.81-93,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409