Gehoski, K. A. ; Resnick, D. J. ; Dauksher, W. J. ; Nordquist, K. J. ; Ainley, E. ; McCord, M. ; Raphaelian, M. ; Hess, H.
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Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA. pp.415-422, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Nordquist, K. J. ; Dauksher, W. J. ; Mancini, D. P. ; Resnick, D. J. ; Hess, H. F. ; Pettibone, D. W. ; Adler, D. ; Bertsche, K. ; White, R. ; Csuy, J. E. ; Lee, D.
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24th Annual BACUS Symposium on Photomask Technology. pp.853-863, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Tsuneoka, M. ; Hasebe, T. ; Tokumoto, T. ; Yan, C. ; Yamamoto, M. ; Resnick, D. J. ; Thompson, E. ; Wakamori, H. ; lnoue, M. ; Ainley, E. ; Nordquist, K. J. ; Dauksher, W. J.
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Photomask Technology 2006. pp.63492D-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Hudek, P. ; Beyer, D. ; Groves, T. R. ; Fortagne, O. K. ; Dauksher, W. J. ; Mancini, D. P. ; Nordquist, K. J. ; Resnick, D. J.
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20th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.204-208, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering