Fundamental gas-phase and surface chemistry of vapor-phase deposition II and process control, diagnostics, and modeling in semiconductor manufacturing IV : proceedings of the international symposium. pp.421-428, 2001. Pennington, N.J.. Electrochemical Society
Nonaka, H. ; Kurokawa, A. ; Nakamura, K. ; Ichimura, S.
Pub. info.:
Amorphous and crystalline insulating thin films--1996 : symposium held December 2-4, 1996, Boston, Massachusetts, U.S.A.. pp.53-, 1997. Pittsburgh, Pa.. MRS - Materials Research Society
Koike, K. ; Inoue, G. ; Ichimura, S. ; Nakamura, K. ; Kurokawa, A. ; Nonaka, H.
Pub. info.:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.121-, 1999. Warrendale, PA. MRS - Materials Research Society
Nonaka, H. ; Kurokawa, A. ; Ichimura, S. ; Moon, D. W.
Pub. info.:
Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A.. pp.493-, 1997. Pittsburgh, Pa.. MRS - Materials Research Society
Ogawa, Y. ; Yamamura, Y. ; Ando, H. ; Kadokura, M. ; Agata, T. ; Fukumoto, M. ; Satake, T. ; Machida, K. ; Sakai, O. ; Miyata, Y. ; Nonaka, H. ; Nakajima, K. ; Hamaya, S. ; Miyazaki, S. ; Ohida, M. ; Yoshioka, T. ; Takagi, S. ; Shimizu, H.
Pub. info.:
Natural and selected synthetic toxins : biological implications. pp.333-, 2000. Washington, D.C. American Chemical Society