1.

Conference Proceedings
Conference Proceedings
1. Production challenges of making an EUV mask blank(Invited Paper)
Aschke, L. ; Becker, H. W. ; Friemel, F. ; Leutbecher, T. ; Olschewski, N. ; Renno, M. ; Ruggeberg, F. ; Schiffler, M. ; Schmidt, F. ; Sobel, F. ; Walter, K. ; Heβ, G. ; Lenzen, F. ; Knapp, K. ; Alkemper, J. ; Hack, H. ; Megges, K. ; Mitra, I. ; Muller, R. ; Nolte, U. ; Schumacher, J. ; Pannhorst, W.
Pub. info.: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.94-104,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5504
2.

Conference Proceedings
Conference Proceedings
2. Improved materials meeting the demands for EUV substrates
Mitra, I. ; Alkemper, J. ; Nolte, U. ; Engel, A. ; Mueller, R. ; Ritter, S. ; Hack, H. ; Megges, K. ; Kohlmann, H. ; Pannhorst, W. ; Davis, M.J. ; Aschke, L. ; Knapp, K.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.219-226,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
3.

Conference Proceedings
Conference Proceedings
3. Optimized glass-ceramic substrate materials for EUVL applications
Mitra, I. ; Alkemper, J. ; Mueller, R. ; Nolte, U. ; Engel, A. ; Hack, H. ; Kohlmann, H. ; Wittmer, V. ; Pannhorst, W. ; Davis, M.J. ; Aschke, L. ; Knapp, K.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.96-103,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374