1.

Conference Proceedings
Conference Proceedings
1. State-of-the-art performance of stencil mask for LEEPL
Nohama, S. ; Omori, S. ; Iwase, K. ; Watanabe, Y. ; Amai, K. ; Sasaki, T. ; Moriya, S. ; Kitagawa, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.970-978,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. On-site use of 1x stencil mask: control over image placement and dimension
Omori, S. ; Iwase, K. ; Watanabe, Y. ; Amai, K. ; Sasaki, T. ; Nohama, S. ; Ashida, I. ; Moriya, S. ; Kitagawa, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.958-969,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Litho-and-mask concurrent approach to the critical issues for proximity electron lithography
Omori, S. ; Iwase, K. ; Amai, K. ; Watanabe, Y. ; Nohama, S. ; Nohdo, S. ; Moriya, S. ; Kitagawa, T. ; Yotsui, K. ; Suzuki, G. ; Tamura, A.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.132-142,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
4.

Conference Proceedings
Conference Proceedings
4. First via-hole TEG fabricated by using 90-nm CMOS technology and proximity electron lithography: electric and lithographic results
Kitagawa, T. ; Yoshizawa, M. ; Iwase, K. ; Omori, S. ; Nohama, S. ; Nakano, H. ; Moriya, S. ; Kawahira, H.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.537-545,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
5.

Conference Proceedings
Conference Proceedings
5. A novel approach to the mask inspection for proximity electron lithography based on electron beam imaging
Iwase, K. ; Omori, S. ; Nohama, S. ; Yotsui, K. ; Suzuki, G. ; Sasaki, Y. ; Itoh, K. ; Tamura, A. ; Maruyama, S. ; Moriya, S. ; Kitagawa, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.915-922,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446