1.

Conference Proceedings
Conference Proceedings
1. INTERFACE REACTIONS DURING OXYGEN PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION OF YTTRIUM OXIDE ON SILICON
Niu, D. ; Asheraft, R.W. ; Stemmer, S. ; Parsons, U.N.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.429-439,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2
2.

Conference Proceedings
Conference Proceedings
2. A real-time voice modification system in virtual community
Du, S. ; Zhan, Y. ; Niu, D.
Pub. info.: Fourth International Conference on Virtual Reality and Its Applications in Industry : 23-25 October 2003, Tianjin, China.  pp.579-582,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5444
3.

Conference Proceedings
Conference Proceedings
3. Integration Issues with High k Gate Stacks*
Osburn, C.M. ; Han, S.K. ; Kim, I. ; Campbell, S.A. ; Garfunkel, E. ; Gustafson, T. ; Hauser, J. ; King, T.-J. ; Liu, Q. ; Ranade, P. ; Kingon, A. ; Kwong, D.-L. ; Lee, S.J. ; Lee, C.H. ; Lee, J. ; Onishi, K. ; Kang, C.S. ; Choi, R. ; Cho, H. ; Nich, R. ; Lucovsky, G. ; Hong, J.G. ; Ma, T.P. ; Zhu, W. ; Luo, Z. ; Maria, J.P. ; Wicaksana, D. ; Misra, V. ; Lee, J.J. ; Suh, Y.S. ; Parksons, G. ; Niu, D. ; Stemmer, S.
Pub. info.: ULSI Process Integration : proceedings of the International Symposium.  pp.375-390,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-6
4.

Conference Proceedings
Conference Proceedings
4. Effect of Al, Ta, and O Precursors on Growth and Properties of Al2O3 and Ta2O5 Thin Films Deposited by Triode PECVD
Klein, T. ; Niu, D. ; Parsons, G.
Pub. info.: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.445-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 567
5.

Conference Proceedings
Conference Proceedings
5. INTERFACE REACTIONS DURING OXYGEN PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION OF YTTRIUM OXIDE ON SILICON
Niu, D. ; Asheraft, R.W. ; Stemmer, S. ; Parsons, U.N.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.429-439,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2