1.

Conference Proceedings
Conference Proceedings
1. Lithographic effects of mask critical dimension error
Wong,A.K. ; Ferguson,R.A. ; Liebmann,L.W. ; Mansfield,S.M. ; Molless,A.F. ; Neisser,M.O.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.106-116,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Adjustment of bilayer optical properties and the effect on imaging and etching performance
Neisser,M.O. ; Biafore,J.J. ; Foster,P. ; Spaziano,G. ; Sarubbi,T.R. ; Driessche,V.Van ; Grozev,G. ; Tzviatkov,P.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.942-951,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Advanced negative resists using novel aminoplast crosslinkers
Afzali,A. ; Gelorme,J.D. ; Kosbar,L.L. ; Neisser,M.O. ; Brunswold,W. ; Feild,C. ; Lawson,M. ; Varanasi,R.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.758-767,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
4.

Conference Proceedings
Conference Proceedings
4. PHS with inert blocking groups for DUV negative resist
Brunsvold,W.R. ; Conley,W. ; Varanasi,P.R. ; Khojasteh,M. ; Patel,N.M. ; Molless,A.F. ; Neisser,M.O. ; Breyta,G.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.372-384,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
5.

Conference Proceedings
Conference Proceedings
5. Simulation and experimental evaluation of double-exposure techniques
Neisser,M.O. ; Molless,A.F.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.372-383,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334