1.

Conference Proceedings
Conference Proceedings
1. Interfacial structure of photoresist thin films in developer solutions
Flack, W. W. ; Nguyen, H.-A. ; Neisser, M. ; Sison, E. ; Lu, P. H. ; Plass, R. ; Makii, T. ; Murakami, Y.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.292-301,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Conference Proceedings
Conference Proceedings
2. Characterization and improvement of resist pattern collapse on ArF (193 nm) organic B.A.R.C.
Hwang, Y.-S. ; Jung, J.-C. ; Park, K.-D. ; Lee, S.-K. ; Kim, J.-S. ; Kong, K.-K. ; Shin, K.-S. ; Ding, S.-J. ; Xiang, Z. ; Neisser, M.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.1119-1125,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
3.

Conference Proceedings
Conference Proceedings
3. Optimization of organic bottom antireflective coatings' compatibility with ArF resists
Xiang, Z. ; Shan, J. ; Gonzalez, E. ; Wu, H. ; Ding, S. ; Neisser, M. ; Ho, B.-C. ; Chen, H.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.1102-1111,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
4.

Conference Proceedings
Conference Proceedings
4. High-resolution negative i-line resist and process for metal lift-off applications
Toukhy, M.A. ; Mullen, S.K. ; Lu, P.-H. ; Neisser, M.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.846-853,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
5.

Conference Proceedings
Conference Proceedings
5. Design and development of high-etch-rate organic bottom antireflective coating for sub-100-nm node and beyond
Wu, H. ; Xiang, Z. ; Hishida, A. ; Abdallah, D. ; Shan, J. ; Gonzalez, E. ; Ding, S.S. ; Neisser, M.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.697-702,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
6.

Conference Proceedings
Conference Proceedings
6. Developable bottom antireflective coatings for 248-nm and 193-nm lithography
Katayama, T. ; Motobayashi, H. ; Kang, W.-B. ; Toukhy, M.A. ; Oberlander, J.E. ; Ding, S.S. ; Neisser, M.
Pub. info.: Optical Microlithography XVII.  pp.968-973,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
7.

Conference Proceedings
Conference Proceedings
7. Modeling of reactive soluble ARCs and photoresist-ARC interaction
Biafore, J.J. ; Neisser, M. ; dela Pena, G. ; Byers, J.D. ; Toukhy, M.A. ; Oberlander, J.E.
Pub. info.: Optical Microlithography XVII.  pp.1435-1451,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377