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12 results

Conference Proceedings

1. Photomask pattern viewer and analyzer: HOTSCOPE [5853-48]

Narukawa, S. ; Yamasaki, K. ; Machiya, Y. ; Hayashi, N.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.643-650, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

2. Evaluation of mask data preparation with OASIS and P10 [5853-46]

Kuriyama, K. ; Machiya, Y. ; Yamasaki, K. ; Narukawa, S. ; Hayashi, N.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.626-633, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

3. Mask pattern quality assurance based on lithography simulation with fine pixel SEM image [5992-59]

Kariya, M. ; Yamanaka, E. ; tanaka, S. ; Ikeda, T. ; Yamaguchi, S. ; Hashimoto, K. ; Itoh, M. ; Kobayashi, H. ; Kawashima, T. ; Narukawa, S.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.59921M-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

4. Enhancement of unified mask data formats for EB writers

Suzuki, T. ; Hirumi, J. ; Yoshioka, N. ; Hojyo, Y. ; Kawase, Y. ; Sakamoto, S. ; Kuriyama, K. ; Narukawa, S. ; Houga, M.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.1186-1194, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

Conference Proceedings

5. Mask rule check for inspection of leading-edge photomask [5992-150]

Sakata, W. ; Yamasaki, K. ; Narukawa, S. ; Hayashi, N.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.59924E-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

6. Optimization of Alt-PSM structure for 100-nm-node ArF lithography: ＩＩ

Mesuda, K. ; Toyama, N. ; Narukawa, S. ; Morikawa, Y. ; Mohri, H. ; Hayashi, N. ; Hoga, M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.396-409, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

Conference Proceedings

7. A photomask defect evaluation system

Yamanaka, E. ; Kanamitsu, S. ; Hirano, T. ; Tanaka, S. ; Ikeda, T. ; Ikenaga, O. ; Kawashima, T. ; Narukawa, S. ; Kobayashi, H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.257-264, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

Conference Proceedings

8. Advanced mask rule check (MRC) tool [6283-98]

Kato, K. ; Nishizawa, K. ; Inoue, T. ; Kuriyama, K. ; Suzuki, T. ; Narukawa, S. ; Hayashi, N. ; Dai Nippon Printing Co., Ltd. (Japan)

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.62830O-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

Conference Proceedings

9. Fine pixel SEM image for mask pattern quality assurance based on lithography simulation [6283-48]

Yamanaka, E. ; Kariya, M. ; Yamaguchi, S. ; Tanaka, S. ; Hashimoto, K. ; Itoh, M. ; Kobayashi, H. ; Kawashima, T. ; Narukawa, S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.62832E-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

10.

Conference Proceedings

10. Evaluation of OASIS. VSB (SEMI P44) for practical use [6283-58]

Kuriyama, K. ; Suzuki, T. ; Narukawa, S. ; Mohri, H. ; Hoga, M. ; Hayashi, N.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.62832O-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

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Author: Narukawa, S.