1.

Conference Proceedings
Conference Proceedings
1. Influence of intermetal dielectric thickness on overlay mark size variation in photolithography
Lee,S.-J. ; Yoo,J.-Y. ; Kim,Y.-C. ; Kim,H. ; Nam,J.-L. ; Chung,U.-I. ; Kang,G.-W. ; Han,W.-S.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.195-204,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
2.

Conference Proceedings
Conference Proceedings
2. Improved overlay measurement of CMP processed layers
Yeo,J.-H. ; Nam,J.-L. ; Oh,S.-H. ; Moon,J.-T. ; Koh,Y.-B. ; Smith,N.P. ; Smout,A.M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.345-354,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
3.

Conference Proceedings
Conference Proceedings
3. Effects of illumination wavelength on the accuracy of optical overlay metrology
Han,J.-S. ; Kim,H. ; Nam,J.-L. ; Han,M.-S. ; Lim,S.-K. ; Yanowitz,S.D. ; Smith,N.P. ; Smout,A.M.C.
Pub. info.: Optical Microlithography X.  pp.417-425,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
4.

Conference Proceedings
Conference Proceedings
4. Pattern deformation induced from intensity-unbalanced off-axis illumination
Kim,J.-H. ; Oh,S.-H. ; Lee,D.-S. ; Yeo,J.-H. ; Yu,Y.-H. ; Nam,J.-L.
Pub. info.: Optical Microlithography X.  pp.54-65,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
5.

Conference Proceedings
Conference Proceedings
5. Method for prevention of unopened contact hole in dual-damascene process
Lyu,G.-H. ; Kim,C.-H. ; Lee,S.-J. ; Yang,H.-H. ; Lee,D.-Y. ; Yoo,J.-Y. ; Lee,J.-W. ; Kim,Y.-H. ; Nam,J.-L. ; Han,W.-S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.22-31,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
6.

Conference Proceedings
Conference Proceedings
6. Mechanism of deep-UV photoresist tail on inorganic antireflective layer film
Lee,S.-J. ; Lee,S.G. ; Kim,M. ; Park,S.-H. ; Nam,J.-L. ; Lee,S.-I.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.305-311,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
7.

Conference Proceedings
Conference Proceedings
7. Control of resist flow process for sub-0.15-μm small contact hole by latent image
Kim,B.-K. ; Lee,S.-J. ; Lee,D.-Y. ; Lee,J.-W. ; Nam,J.-L.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.297-304,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
8.

Conference Proceedings
Conference Proceedings
8. Improved overlay reading on MLR structures
Yeo,J.-H. ; Nam,J.-L. ; Oh,S.-H. ; Moon,J.-T. ; Koh,Y.-B. ; Smith,N.P. ; Smout,A.M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.355-364,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725