1.

Conference Proceedings
Conference Proceedings
1. Wafer scale error induced by bottom antireflective coating
Kim,D.-S. ; Jeong,J.-H. ; Nam,B.-H. ; Hwang,Y.J. ; Song,Y.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.608-615,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
2.

Conference Proceedings
Conference Proceedings
2. Probe-beam scan-type autofocus system using position-sensing detector for subhalf micrometer lithography tools
Kim,D.H. ; Nam,B.-H. ; Lee,K.H. ; Chung,H.B. ; Yoo,H.J.
Pub. info.: Optical Microlithography IX.  Part2  pp.876-885,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726