1.

Conference Proceedings
Conference Proceedings
1. Redidual End-of-Range Damage Reduction in Low-Temperature-Annealed Ion-Implanted Junctions by Using Low-Doped Silicon Substrate
Tamai, Y. ; Oka, M.M. ; Nakada, A. ; Shibata, T. ; Ohmi, T.
Pub. info.: ULSI science and technology, 1997 : proceedings of the Sixth International Symposium on Ultralarge Scale Integration Science and Technology.  pp.643-654,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-3
2.

Conference Proceedings
Conference Proceedings
2. Arbitrary pattern fabrication with a LCD reticle-free exposure method
Morimoto, T. ; Nakamura, K. ; Kubota, H. ; Nakada, A. ; Akamichi, T. ; Inokuchi, T. ; Kosaka, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.347-356,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Development of reticle-free exposure method with LCD projection image
Nakamura, K. ; Kubota, H. ; Nakada, A. ; Inokuchi，T. ; Kosaka, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.737-744,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754