1.

Conference Proceedings
Conference Proceedings
1. New materials for 193-nm trilayer imaging
Meador, J.D. ; Holmes, D. ; Nagatkina, M.I. ; Puligadda, R. ; Gum, D. ; Bennett, R. ; Sun, S.X. ; Enomoto, T.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1138-1148,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
2.

Conference Proceedings
Conference Proceedings
2. New BARC materials for the 65-nm node in 193-nm lithography
Neef, C.J. ; Krishnamurthy, V. ; Nagatkina, M.I. ; Bryant, E. ; Windsor, M. ; Nesbit, C.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.684-688,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
3.

Conference Proceedings
Conference Proceedings
3. 193-nm multilayer imaging systems
Meador, J.D. ; Holmes, D. ; DiMenna, W. ; Nagatkina, M.I. ; Rich, M.D. ; Flaim, T.D. ; Bennett, R. ; Kobayashi, I.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.948-959,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039