Nagamura, Y. ; Hosono, K. ; Pang, L. ; Chan, K.K. ; Tanaka, Y.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology X. pp.476-483, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Nagamura, Y. ; Kanai, I. ; Tange, K. ; Hosono, K. ; Hayashi, K. ; Ikeda, H. ; Nagashige, S. ; Ishijima, M. ; Iwasaki, H. ; Kikuchi, Y.
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Photomask and Next-Generation Lithography Mask Technology X. pp.466-475, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Nagamura, Y. ; Maetoko, K. ; Maeshima, K. ; Tamada, N. ; Hosono, K. ; Fujimoto, M. ; Kodera, Y. ; Goto, K. ; Narita, T. ; Matsuo, F. ; Akima, S. ; Ishijima, M. ; Iwasaki, H. ; Kikuchi, Y.
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Photomask and Next-Generation Lithography Mask Technology X. pp.454-465, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Nagamura, Y. ; Momose, S. ; Imai, A. ; Hosono, K. ; Morikawa, Y. ; Kojima, K. ; Mohri, H. ; Dai Nippon Printing Co., Ltd. (Japan)
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XII. pp.977-987, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering