1.

Conference Proceedings
Conference Proceedings
1. Multipass gray printing for a new MEBES 4500S mask lithography system
Abboud,F.E. ; Dean,R.L. ; Doering,J.J. ; Eckes,W. ; Gesley,M.A. ; Hofmann,U. ; Mulera,T. ; Naber,R.J. ; Pastor,M. ; Phillips,W. ; Raphael,J. ; Raymond,F.,?. ; Sauer,C.A.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.116-124,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. Extension of graybeam writing for the 130-nm technology node
Chabala,J.M. ; Abboud,F.E. ; Sauer,C.A. ; Weaver,S. ; Lu,M. ; Pearce-Percy,H.T. ; Hofmann,U. ; Vernon,M. ; Ton,D. ; Cole,D.M. ; Naber,R.J.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.36-48,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Investigation of MEBES 4500 system composite performance
DeWitt,J. ; Watson,J. ; Alexander,D. ; Cook,A. ; Gasiorek,L. ; Mayse,M. ; Naber,R.J. ; Phillips,W. ; Sauer,C.A.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.19-26,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621
4.

Conference Proceedings
Conference Proceedings
4. High-productivity mask writer with broad operating range
Baik,K.-H. ; Chakarian,V. ; Dean,B. ; Lu,M. ; Naber,R.J. ; Newman,T.H. ; Wiltse,M. ; Abboud,F.E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.228-237,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
5.

Conference Proceedings
Conference Proceedings
5. 100-nm OPC mask patterning using raster-scan 50-kV pattern generation technology
Abboud,F.E. ; Baik,K.-H. ; Chakarian,V. ; Cole,D.M. ; Daniel,J.P. ; Dean,R.L. ; Gesley,M.A. ; Lu,M. ; Naber,R.J. ; Newman,T.H. ; Raymond Ⅲ,F. ; Trost,D. ; Wiltse,M. ; Abboud,F.E.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.1-8,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
6.

Conference Proceedings
Conference Proceedings
6. Evaluation of the MEBES 4500 reticle writer to commercial requirements of 250-nm design rule IC devices
Abboud,F.E. ; Alexander,D. ; Coleman,T.P. ; Cook,A. ; Gasiorek,L. ; Naber,R.J. ; Raymond,F. ; Sauer,C.A.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.438-451,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793
7.

Conference Proceedings
Conference Proceedings
7. Method to produce a reference grid artifact for matching a MEBES 4500 system to an external reference
DeWitt,J. ; Watson,J. ; Coleman,T.P. ; Gasiorek,L. ; Lubin,M.D. ; Naber,R.J. ; Wang,W. ; Wires,K.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.208-213,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621