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Conference Proceedings

1. Dislocation Formation in Epitaxial Film by Propagation of Shallow Dislocations on 4H-SiC Substrate

Y. Ishikawa ; K. Sato ; Y. Okamoto ; N. Hayashi ; Y.Z. Yao

Pub. info.:	Silicon carbide and related materials 2011 : selected, peer reviewed papers from the 14th International Conference on Silicon Carbide and Related Materials 2011 (ICSCRM 2011), September 11-16, 2011, Cleveland, Ohio, USA. pp.383-386, 2012. Aedermannsdorf, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	717-720

Conference Proceedings

2. Structure of Ni-Al Intermetallic Porous Thick Films Produced by Microscopic Reactive Infiltration

N. Hayashi ; T. Ohmi ; M. Iguchi

Pub. info.:	Multiscale, multifunctional and functionally graded materials : selected, peer reviewed papers from the 10th International Symposium on MM & FGMs, 22nd-25th September 2008, Sendai, Japan. pp.345-352, 2010. Aedermannsdorf, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	631-632

Conference Proceedings

3. Pol-In-SAR for GB-SAR and GPR

M. Sato ; M. Matsumoto ; N. Hayashi

Pub. info.:	Proceedings of the Fourth International Workshop on Science and Applications of SAR Polarimetry and Polarimetric Interferometry, 26-30 January 2009, Frascati, Italy. 2009. Noordwijk, the Netherlands. ESA Communication Production Office
Title of ser.:	ESA SP
Ser. no.:	668

Conference Proceedings

4. Chromium-based attenuated phase shifter for DUV exposure

H. Mohri ; M. Takahashi ; K. Mikami ; H. Miyashita ; N. Hayashi

Pub. info.:	14th annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California. pp.288-298, 1994. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2322

Conference Proceedings

5. Application of chemically amplified resists to photomask fabrication

M. Arai ; H. Inomata ; T. Nishimura ; M. Kurihara ; N. Hayashi

Pub. info.:	Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan. pp.74-87, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2512

Conference Proceedings

6. Development and evaluation of chromium-based attenuated phase-shift masks for DUV exposure

K. Mikami ; H. Mohri ; H. Miyashita ; N. Hayashi ; H. Sano

Pub. info.:	Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan. pp.333-342, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2512

Conference Proceedings

7. Evaluation of CD metrology tools for photomasks for 0.25-µm devices

H. Fujita ; S. Sasaki ; H. Miyashita ; N. Hayashi ; H. Sano

Pub. info.:	Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan. pp.263-273, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2512

Conference Proceedings

8. EBR900 processes in e-beam and laser beam lithographies for photomask fabrication

M. Kurihara ; M. Komada ; H. Moro-oka ; N. Hayashi ; H. Sano

Pub. info.:	Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California. pp.240-252, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2437

Conference Proceedings

9. A new model of haze generation and storage-life-time estimation for mask

S. Shimada ; N. Kanda ; N. Takahashi ; H. Nakajima ; H. Tanaka ; H. Ishii ; Y. Shoji ; M. Ohtsuki ; A. Naitoh ; N. Hayashi

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

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Conference Proceedings

10. EUV mask pattern inspection using current DUV reticle inspection tool

T. Abe ; A. Fujii ; S. Sasaki ; H. Mohri ; H. Imai ; H. Takaya ; Y. Sato ; N. Hayashi ; Y. Maenaka

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

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Author: N. Hayashi