Peterson, J. ; Barnett, J. ; Young, C. ; Hou, A. ; Gutt, J. ; Gopalan, S. ; Lee, C.H. ; Li, H.J. ; Moumen, N. ; Chaudhary, N. ; Lee, B.H. ; Bersuker, G. ; Zietzoff, P. ; Brown, G.A. ; Lysaght, P. ; Gardner, M. ; Murto, R.W. ; Huff, H.
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Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium. pp.93-99, 2003. Pennington, NJ. Electrochemical Society
Londergan, A.R. ; Ramanathan, S. ; Winkler, J. ; Seidel, T.E. ; Gntt, J. ; Brown, G. ; Murto, R.W.
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Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium. pp.243-264, 2003. Pennington, NJ. Electrochemical Society
Rapid thermal and other short-time processing technologies II : proceedings of the international symposium. pp.263-296, 2001. Pennington, NJ. Electrochemical Society
Si front-end processing - physics and technology of dopant-defect interactions II : symposium held April 24-27, 2000, San Francisco, California, U.S.A.. pp.B10.1-, 2001. Warrendale, PA. Materials Research Society
Bersuker, G. ; Sim, J.H. ; Young, C.D. ; Choi, R. ; Lee, B.H. ; Lysaght, P. ; Brown, G.A. ; Zeitzoff, P.M. ; Gardner, M. ; Murto, R.W. ; Huff, H.R.
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Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A.. pp.31-36, 2004. Warrendale, Pa.. Materials Research Society
Barnett, Joel ; Moumen, N. ; Gutt, J. ; Gardner, M. ; Huffman, C. ; Majhi, P. ; Peterson, J.J. ; Gopalan, S. ; Foran, B. ; Li, H.-J. ; Lee, B.H. ; Bersuker, G. ; Zeitzoff, P.M. ; Brown, G.A. ; Lysaght, P. ; Young, C. ; Murto, R.W. ; Huff, H.R.
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Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A.. pp.841-846, 2004. Warrendale, Pa.. Materials Research Society