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29 results

Conference Proceedings

1. Stress control of Mo/Si-based multilayer coatings deposited by ion-beam sputtering

Murakami,K. ; Shiraishi,M.

Pub. info.:	Soft X-ray and EUV imaging systems II : 31 July-1 August 2001, San Diego, USA. pp.56-64, 2001. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4506

Conference Proceedings

2. Feasibility study of EUV scanners

Ota,K. ; Murakami,K. ; Kondo,H. ; Oshino,T. ; Sugisaki,K. ; Komatsuda,H.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.60-69, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343

Conference Proceedings

3. Development of multilayer mirrors for the XUV Doppler telescope

Nagata,S. ; Hara,H. ; Sakao,T. ; Shimizu,T. ; Tsuneta,S. ; Yoshida,T. ; Ishiyama.W. ; Murakami,K. ; Oshino,T.

Pub. info.:	Grazing incidence and multilayer X-ray optical systems : 27-29 July 1997, San Diego, California. pp.193-201, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3113

Conference Proceedings

4. Three-aspherical-mirror system for EUV lithography (Invited Paper)

Kinoshita,H. ; Watanabe,T. ; Niibe,M. ; Ito,M. ; Oizumi,H. ; Yamanashi,H. ; Murakami,K. ; Oshino,T. ; Platonov,Y.Y. ; Grupido,N.

Pub. info.:	Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California. pp.20-31, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3331

Conference Proceedings

5. Stress reduction of molybdenum/silicon multilayers deposited by ion-beam sputtering

Shiraishi,M. ; Ishiyama,W. ; Oshino,T. ; Murakami,K.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.620-627, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

6. Development for the alignment procedure of three-aspherical-mirror optics

Irie,S. ; Watanabe,T. ; Kinoshita,H. ; Miyafuji,A. ; Sugisaki,K. ; Oshino,T. ; Murakami,K.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.807-813, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

7. Assembly and alignment of three-aspherical-mirror optics for extreme ultraviolet projection lithography

Sugisaki,K. ; Oshino,T. ; Murakami,K. ; Watanabe,T. ; Kinoshita,H. ; Miyafuji,A. ; Irie,S. ; Shirayone,S.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.751-758, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

8. Crystallinities and light-emitting properties of nanostructured SiGe alloy prepared by pulsed laser ablation in inert background gases

Yoshida,T. ; Yamada,Y. ; Suzuki,N. ; Makino,T. ; Orii,M.T. ; Murakami,K. ; Geohegan,D.B. ; Lowndes,D.H. ; Aziz,M.J.

Pub. info.:	Laser applications in microelectronic and optoelectronic manufacturing IV : 25-27 January 1999, San Jose, California. pp.512-519, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3618

Conference Proceedings

9. Development of an EUV reflectometer using a laser plasma x-ray source

Kondo,H. ; Kandaka,N. ; Sugisaki,K. ; Oshino,T. ; Shiraishi,M. ; Ishiyama,W. ; Murakami,K.

Pub. info.:	Advances in laboratory-based X-ray sources and optics : 31 July-1 August 2000, San Diego, USA. pp.76-81, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4144

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Conference Proceedings

10. Simulation of the characteristics of 850-nm superluminescent diodes

Yoshidaya,H. ; Murakami,K. ; Tsuchiya,F. ; Nagai,H.

Pub. info.:	Fiber optic gyros : 20th anniversary conference : 5-6 August 1996, Denver, Colorado. pp.304-314, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2837

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Author: Murakami,K.