1.

Conference Proceedings
Conference Proceedings
1. Effect of developer surfactant on lithography process latitudes and post pattern defect concentration
Mukherjee-Roy, M. ; Wei, N.S. ; Kumar, R. ; Kawada, S.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.703-711,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
2.

Conference Proceedings
Conference Proceedings
2. Evaluation of alignment target designs for Cu and low-K dual damascene processes
Mukherjee-Roy, M. ; Singh, N. ; Mehta, S.S. ; Chik, W.M. ; Sim, C.T. ; Cheong, F.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.93-102,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
3.

Conference Proceedings
Conference Proceedings
3. Impact of scattering bars in damascene trench patterning
Mehta, S.S. ; Singh, N. ; Mukherjee-Roy, M. ; Kumar, R.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.967-971,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. Effect of feature size, pitch, and resist sensitivity on side-lobe and ring formation for via hole patterning in attenuated phase-shift masks
Singh, N. ; Mukherjee-Roy, M.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1054-1061,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. Key challenges in across-pitch 0.33-k1 trench patterning using hybrid mask
Singh, N. ; Mukherjee-Roy, M. ; Mehta, S.S. ; Suda, H. ; Kubota, T. ; Kimura, Y. ; Kinoshita, H.
Pub. info.: Optical Microlithography XVII.  pp.1334-1341,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
6.

Conference Proceedings
Conference Proceedings
6. Alignment in chromeless masks
Mukherjee-Roy, M. ; Singh, N. ; Mehta, S.S. ; Suda, H. ; Kubota, T. ; Kimura, Y. ; Kinoshita, H.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.96-104,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375