1.

Conference Proceedings
Conference Proceedings
1. Progress of a CVD-based photoresist 193-nm lithography process
Lee, C. Y. ; Sugiarto, D. ; Liao, L. ; Mui, D. ; Weidman, T. W. ; Nault, M. P. ; Tryba, T.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.329-341,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. Characterization of Polysilicon Gate Etch with Ultra Thin Gate Oxide (<35 A゜) in a Decoupled Plasma Source Etcher
Lii, T. ; Park, E. ; Lutz, J. ; Wu, W. ; Simpson, L. ; Mui, D.
Pub. info.: Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes.  pp.79-84,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-30
3.

Conference Proceedings
Conference Proceedings
3. Generating sub-30-nm polysilicon gates using PECVD amorphous carbon as hardmask and anti-reflective coating
Liu, W. ; Mui, D. ; Lill, T. ; Wang, M.D. ; Bencher, C. ; Kwan, M. ; Yeh, W. ; Ebihara, T. ; Oga, T.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.841-848,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. Line-profile and critical-dimension correlation between a normal-incidence optical CD metrology system and SEM
Yang, W. ; Lowe-Webb, R. ; Korlahalli, R. ; Zhuang, V.G. ; Sasano, H. ; Liu, W. ; Mui, D.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.966-976,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689