1.

Conference Proceedings
Conference Proceedings
1. Spin stand characterization of dielectric optical waveguides fabricated on AlTiC sliders for heat-assisted magnetic recording
Rausch, T. ; Mihalcea, C. ; Pelhos, K. ; Peng, C. ; Gage, E. C. ; Mountfield, K. ; Seigler, M. A. ; Challener, W. A.
Pub. info.: Optical data storage 2004 : 18-21 April 2004, Monterey, California, USA.  pp.40-46,  2004.  Bellingham.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5380
2.

Conference Proceedings
Conference Proceedings
2. Fabrication of dielectric optical waveguides on AlTiC sliders for heat-assisted magnetic recording
Mihalcea, C. ; Pelhos, K. ; Rausch, T. ; Peng, C. ; Challener, W. A. ; Gage, E. C. ; Mountfield, K. ; Seigler, M. A.
Pub. info.: Optical data storage 2004 : 18-21 April 2004, Monterey, California, USA.  pp.34-39,  2004.  Bellingham.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5380
3.

Conference Proceedings
Conference Proceedings
3. Electron-beam lithography method for sub-50-nm isolated trench with high aspect ratio
Yang, X.M. ; Eckert, A.R. ; Mountfield, K. ; Gentile, H. ; Seiler, C. ; Brankovic, S. ; Harris, R. ; Johns, E.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.168-177,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
4.

Conference Proceedings
Conference Proceedings
4. Three-dimensional imaging of isolated lines of negative e-beam resist
Eckert, A.R. ; Gentile, H. ; Mountfield, K. ; Seiler, C. ; Yang, X. ; Johns, E.
Pub. info.: Emerging Lithographic Technologies VII.  2  pp.1074-1083,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
5.

Conference Proceedings
Conference Proceedings
5. Electron-beam lithography of isolated trenches with chemically amplified positive resist
Eckert, A.R. ; Bojko, R.J. ; Gentile, H. ; Harris, R. ; Jayashankar, J. ; Johns, E. ; Minor, K. ; Mountfield, K. ; Seiler, C. ; Yang, X.M.
Pub. info.: Emerging Lithographic Technologies VI.  Part Two  pp.878-887,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688